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High-Purity 300mm Chromium Targets from China Suppliers and Factory for Precision Applications

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Chromium targets are essential materials derived from high-purity chromium metal (Cr), featuring a steel-gray, shiny, hard, and brittle characteristic. These targets are known for their ability to produce stable chromium ion beams in a vacuum, making them ideal for applications in China’s manufacturing industry. As a leading supplier and factory for chromium targets, we provide high-quality products that meet the demands for creating surface coatings and substrates tailored to enhance oxidation resistance in industrial parts. Additionally, our chromium targets are utilized in stoichiometric studies of chromium compounds, showcasing their versatility and importance in various industrial processes.

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    Characteristics

    Film Properties

    • Strong adhesion The chromium film has a strong bond with glass, metal, and polymer substrates, making it an ideal adhesion layer material.
    • Hardness and wear resistance The film hardness can reach 800-1000 HV, which significantly improves the scratch resistance of the device surface.
    • Corrosion resistance Stable in humid, salt spray and acidic environments, widely used in protective coatings.

    Sputtering Performance

    • High sputtering rate High density (≥7.2 g/cm³) and low oxygen content (≤500 ppm) improve the deposition efficiency.
    • Uniform and dense film formation The grain size is small (≤30μm), and the film thickness is unevenly distributed ≤5%, which is suitable for coating large substrates.
    • Low particle defects Ultra-high purity (≥99.95%) reduces particulate contamination during sputtering.

    Chemistry & Tech Compatibility

    • Oxidation resistance Forms a dense Cr₂O₃ passivation layer in the air to protect the underlying material.
    • Low-temperature deposition capacity Can form a film at a low temperature of ≤150°C, compatible with heat-sensitive substrates such as plastics.
    • Excellent etching characteristics High selectivity with photoresist etching, simple graphic process.

    Frequently Asked Questions (FAQ)

    Why is Chromium film used as an adhesion layer?
    Chromium film exhibits strong adhesion and forms a highly robust bond with various substrates, including glass, metal, and polymers, making it an ideal choice for adhesion layers.
    What is the hardness and durability of Chromium film?
    The film hardness can reach 800-1000 HV, which significantly enhances the wear resistance and scratch resistance of the device surface.
    How does the sputtering rate and purity affect the deposition process?
    A high density (≥7.2 g/cm³) and low oxygen content (≤500 ppm) improve deposition efficiency, while an ultra-high purity (≥99.95%) minimizes particulate contamination during the sputtering process.
    Can Chromium films be applied to heat-sensitive substrates?
    Yes, Chromium films support low-temperature deposition capacity (≤150°C), making them fully compatible with heat-sensitive substrates such as plastics.
    How does Chromium film protect materials from environmental corrosion?
    Chromium film is highly stable in humid, salt spray, and acidic environments. Additionally, it forms a dense Cr₂O₃ passivation layer in the air to protect the underlying materials from oxidation.
    What are the grain size and thickness distribution limits for uniform coating?
    The grain size is kept small (≤30μm), and the film thickness unevenness is distributed within ≤5%, making it highly suitable for uniform and dense film formation on large substrates.