High-Purity 300mm Cr Targets by China Suppliers | Reliable Factory for Precision Applications
Characteristics
Film properties
Strong adhesion
The chromium film has a strong bond with glass, metal, and polymer substrates, making it an ideal adhesion layer material.
Hardness and wear resistance
The film hardness can reach 800-1000 HV, which significantly improves the scratch resistance of the device surface.
Corrosion resistance
stable in humid, salt spray and acidic environments, widely used in protective coatings;
Efficient sputtering performance
High sputtering rate
high density (≥7.2 g/cm³) and low oxygen content (≤500 ppm) improve the deposition efficiency;
Uniform and dense film formation
the grain size is small (≤30μm), and the film thickness is unevenly distributed ≤5%, which is suitable for coating large substrates;
Low particle defects
ultra-high purity (≥99.95%) reduces particulate contamination during sputtering.
Compatibility of Chemistry and Technology
Oxidation resistance
forms a dense Cr₂O₃ passivation layer in the air to protect the underlying material;
Low-temperature deposition capacity
can form a film at a low temperature of ≤150°C, compatible with heat-sensitive substrates such as plastics;
Excellent etching characteristics
high selectivity with photoresist etching, simple graphic process;
Frequently Asked Questions (FAQ)
What are the primary film properties of Chromium coatings?
Chromium films are highly valued for their strong adhesion to glass, metal, and polymer substrates. They offer excellent hardness and wear resistance (up to 800-1000 HV) and outstanding corrosion resistance in humid, salt spray, and acidic environments.
Why is Chromium commonly used as an adhesion layer?
Due to its atomic structure and chemical properties, Chromium forms exceptionally strong chemical bonds with various substrate materials like glass, plastics, and other metals, making it a standard interface layer in thin-film stacks.
How does Chromium sputtering achieve high efficiency?
High efficiency is achieved through a high density target (≥7.2 g/cm³), low oxygen content (≤500 ppm), and small grain size (≤30μm). These properties ensure a fast sputtering rate and uniform, dense film thickness distribution with minimal defects.
Can Chromium films be deposited on heat-sensitive substrates?
Yes, Chromium supports low-temperature deposition capacity. It can successfully form stable, high-quality films at temperatures of ≤150°C, making it compatible with heat-sensitive materials such as plastics and polymers.
How does Chromium protect underlying materials from oxidation?
When exposed to air, Chromium naturally forms a dense, stable chromium oxide (Cr₂O₃) passivation layer. This layer acts as a barrier that prevents oxygen and corrosive agents from penetrating and damaging the underlying substrate.
Are Chromium films easy to pattern and etch?
Yes, Chromium films exhibit excellent etching characteristics. They show high selectivity during photoresist etching, which simplifies the overall graphic and photolithography processes in microelectronics and optics manufacturing.