Powder Metallurgy Targets

Iron-cobalt-tantalum alloy is an alloy composed of iron, cobalt and tantalum, the target shape is usually round, and the deposition of the film layer is an important soft magnetic layer material for vertical magnetic recording medium. Since the alloy material contains a large amount of tantalum, segregation will occur during the solidification process, which does not help to deposit a film with uniform composition, and we use a unique fast cooling process to obtain an alloy target with fine grains and uniform composition. In order to ensure the purity of the material and reduce the number of inclusions, the high-purity stable crucible and high-vacuum melting technology are adopted to ensure the purity of the material, improve the mechanical properties of the material, and avoid the cracking of the target during use.

W–Si alloy blocks were prepared by vacuum calcination, using the W and Si mixed powders as the raw materials, and the W–Si sputtering targets followed the requirements of semiconductor application were successfully prepared by crushing and sintering. The influence of calcination temperature and holding time on the phase composition, microstructure, oxygen content, and carbon content (mass fraction) of the alloyed block was investigated. The results indicate that the oxygen content and carbon content can be remarkably reduced by high temperature calcination process. In addition, the calcination temperature has an important effect on the removal of oxygen. The optimal preparation process is the calcination at 1250 ℃ for 5 h. Under this condition, the mass fraction of oxygen in the material can be reduced from 0.3000% to 0.0121%, and the elemental tungsten phase in the material is completely transformed into the tungsten−silicon alloy phase.

High-purity tungsten target refers to the material with tungsten purity of 99.999% or more in the target. It is mainly prepared by high-purity tungsten powder pressed blank by hot rolling after high-temperature sintering. It has the properties of high purity, high density, high melting point, low resistance, good elasticity, low expansion coefficient, small vapor pressure, strong deflection strength, and good thermochemical stability.

Chromium targets have the same properties as chromium metal (Cr). Chromium target is a steel-gray, shiny, hard, and brittle transition metal. In a vacuum, chromium targets can produce relatively stable chromium ion beams, which allows them to be used to make substrates or surface coatings to protect substrates or to make industrial parts that require high oxidation resistance. Chromium targets can also be used to prepare stoichiometric studies of chromium compounds.

Tungsten titanium alloy target is produced by powder metallurgy technology, tungsten titanium alloy is an alloy material with the advantages of both transition metal tungsten and titanium. It has the characteristics of higher density and purity, better corrosion resistance, and less volumetric expansion effect, which can effectively reduce the formation of particles in the manufacturing process, that is, it can successfully prepare high-quality products. According to the different purposes of use, there are different requirements for the impurity content of high-purity tungsten target and tungsten titanium target, and the chemical purity is generally required to be between 99.99%~99.999%, and we can also customize other specifications suitable for the application according to user requirements.