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Powder Metallurgy Targets
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Powder Metallurgy Targets
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Featured Products
High-purity tungsten target 300mm W Target
Tungsten titanium alloy target 300mm WTi Target
Reliable 300mm WSi Target for Enhanced Performance
High-Purity 300mm Cr Target for Precision Applications
Iron Cobalt Tantalum alloy FeCoTa
MoSi alloy target：excellent Film uniformity
MoTi alloy target：core material for hard coating
CrSi alloy target：customizable to different specifications
Molybdenum target:specifically used for sputter coating
Boron Carbide target：special for PVD
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Powder Metallurgy Targets
01
High-purity tungsten target 300mm W Target
02
Tungsten titanium alloy target 300mm WTi Target
03
Reliable 300mm WSi Target for Enhanced Performance
04
High-Purity 300mm Cr Target for Precision Applications
05
Iron Cobalt Tantalum alloy FeCoTa
06
MoSi alloy target：excellent Film uniformity
07
MoTi alloy target：core material for hard coating
08
CrSi alloy target：customizable to different specifications
09
Molybdenum target:specifically used for sputter coating
10
Boron Carbide target：special for PVD
11
Magnesium Zinc Oxide target：widely used in UV optoelectronics
12
Zinc Oxide Target：excellent thin film property
13
Alumina target：applied for multiple cutting-edge manufacturing fields
