High-Purity Alumina Ceramic Targets from China Suppliers | Factory Precision for Cutting-Edge Manufacturing
Film properties
The prepared alumina film has extremely high resistivity (>10¹⁴ Ω·cm) and dielectric strength (~10 MV/cm), making it an ideal material for insulation and dielectric layers.
The extremely high hardness of the film (9 on the Mohs scale, second only to diamond) can significantly enhance the scratch and wear resistance of the device surface.
Extremely resistant to most acids, alkalis, and solvents, with excellent corrosion resistance and stability at high temperatures.
Sputtering and Film Formation Properties
Ultra-high purity (≥99.9%) and strict composition control ensure stable film performance and avoid electrical or optical defects caused by impurity introduction.
High target density (≥3.6 g/cm³) and uniform grain size enable high-quality film deposition with low defects and good thickness uniformity (inhomogeneity ≤5%).
The ceramic structure is stable, not prone to cracking or powder loss during long-term sputtering, and has a long service life.
Compatibility of Chemistry and Technology
The melting point is extremely high (2054°C), and the prepared films can work in high-temperature environments without degradation.
Sputtering in inert gas (Ar), reactive gas (O₂), or mixed gas environments with a wide process window.
Good adhesion to a wide range of substrates (silicon wafers, glass, metals, etc.) and can be used as a functional or protective layer.