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CrSi alloy target：customizable to different specifications
Functional characteristics of thin films
Controllable resistance characteristics: CrSi thin films have a wide resistivity range, which allows for high-precision resistor preparation through composition adjustment.
High Thermal Stability: Maintains stable electrical properties in high-temperature environments (≤800°C), making it suitable for high-temperature devices.
Strong adhesion and corrosion resistance: Strong bonding with ceramic and silicon substrates, and resistance to acidic and oxidative environmental corrosion.
Efficient sputtering performance
Efficient sputtering performance
Uniform alloy structure: High density and low porosity ensure uniform and consistent sputtering film composition.
Low sputtering defects: High purity (≥99.9%) and low impurity content (oxygen content ≤600 ppm) reduce film formation defects.
Good crystallization control ability: The crystalline/amorphous structure of the thin film can be adjusted through process parameters to adapt to different application needs.
Compatibility of Craft and Integration
Compatibility of Craft and Integration
Low-temperature film deposition capability: Can be deposited at ≤200°C, compatible with temperature-sensitive silicon-based semiconductor processes.
Etching and Graphing Friendly: Compatible with dry/wet etching processes with high graphic accuracy for micromachining.
Compatible with semiconductor processes: Free of contaminating elements (e.g., sodium, potassium), meeting the requirements of integrated circuit manufacturing.
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Semiconductors and Microelectronics
Thin film resistor materials: Used in high-precision thin-film resistors (e.g., chip resistors, integrated circuit load resistors) to provide a stable temperature coefficient (TCR).
Diffusion Barrier: Suppresses copper diffusion in copper interconnect structures to improve device reliability.
Phase change memory: As the electrode contact layer of the Ge-Sb-Te series phase change memory.
Sensors and Functional Devices
Temperature sensors: CrSi thin films are used to prepare high-sensitivity temperature sensors (e.g., automotive electronics, industrial temperature control systems).
Strain sensing layer: Used as a piezoresistive material in MEMS devices to achieve mechanical stress signal conversion.
Photodetector: The contact electrode and signal transmission layer used for infrared detectors.
New Energy and Optical Technology
Solar Cell Electrodes: Act as the back contact layer or transparent conductive oxide (TCO) support layer for thin-film solar cells.
Optically Controlled Film: Used as a reflective layer or absorption regulation layer for infrared optics.
Magnetic Recording Head Material: Used as a lead or shield material in the hard disk head.
Wafer-level packaging: Used for resistors and isolation layers for advanced packaging technologies such as U-Chip and TSV.
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