High-Purity Alumina Ceramic Targets from China Suppliers | Quality Factory for Advanced Manufacturing Applications
Film properties
High insulation
The prepared alumina film has extremely high resistivity (>10¹⁴ Ω·cm) and dielectric strength (~10 MV/cm), making it an ideal material for insulation and dielectric layers.
High hardness and wear resistance
The extremely high hardness of the film (9 on the Mohs scale, second only to diamond) can significantly enhance the scratch and wear resistance of the device surface.
Excellent chemical stability
Extremely resistant to most acids, alkalis, and solvents, with excellent corrosion resistance and stability at high temperatures.
Sputtering and Film Formation Properties
High Purity and Consistency
Ultra-high purity (≥99.9%) and strict composition control ensure stable film performance and avoid electrical or optical defects caused by impurity introduction.
Dense and uniform film formation
High target density (≥3.6 g/cm³) and uniform grain size enable high-quality film deposition with low defects and good thickness uniformity (inhomogeneity ≤5%).
Process stability
The ceramic structure is stable, not prone to cracking or powder loss during long-term sputtering, and has a long service life.
Compatibility of Chemistry and Technology
Excellent thermal stability
The melting point is extremely high (2054°C), and the prepared films can work in high-temperature environments without degradation.
Wide Gas Compatibility
Sputtering in inert gas (Ar), reactive gas (O₂), or mixed gas environments with a wide process window.
Good Adhesion
Good adhesion to a wide range of substrates (silicon wafers, glass, metals, etc.) and can be used as a functional or protective layer.
Frequently Asked Questions
What are the insulating capabilities of the prepared alumina film?
The prepared alumina film features high insulation performance, offering an extremely high electrical resistivity of over 10¹⁴ Ω·cm and a dielectric strength of approximately 10 MV/cm. This makes it an ideal material choice for dielectric and insulation layers.
How does the film enhance surface scratch resistance?
With a hardness rating of 9 on the Mohs scale (which is second only to diamond), the alumina film provides high hardness and wear resistance, significantly increasing the scratch resistance of device surfaces.
What ensures the uniformity and quality of the deposited film?
High target density (≥3.6 g/cm³) and uniform grain size enable dense and uniform film deposition. This minimizes defects and ensures high thickness uniformity with inhomogeneity kept at or below 5%.
Can the alumina film operate in high-temperature environments?
Yes. Thanks to its high melting point of 2054°C, the film exhibits excellent thermal stability, allowing it to perform reliably under high-temperature conditions without degradation.
What types of substrates are compatible with the film?
The film shows good adhesion compatibility with a wide range of substrates, including silicon wafers, glass, and metals. This allows it to serve effectively as both a functional and a protective layer.