High-Purity 300mm Chromium Targets from China Suppliers - Precision Applications Factory Solutions
Characteristics
Film properties
Strong adhesion
The chromium film has a strong bond with glass, metal, and polymer substrates, making it an ideal adhesion layer material.
Hardness and wear resistance
The film hardness can reach 800-1000 HV, which significantly improves the scratch resistance of the device surface.
Corrosion resistance
Stable in humid, salt spray and acidic environments, widely used in protective coatings.
Efficient sputtering performance
High sputtering rate
High density (≥7.2 g/cm³) and low oxygen content (≤500 ppm) improve the deposition efficiency.
Uniform and dense film
The grain size is small (≤30μm), and the film thickness is unevenly distributed ≤5%, which is suitable for coating large substrates.
Low particle defects
Ultra-high purity (≥99.95%) reduces particulate contamination during sputtering.
Compatibility of Chemistry and Technology
Oxidation resistance
Forms a dense Cr₂O₃ passivation layer in the air to protect the underlying material.
Low-temperature deposition
Can form a film at a low temperature of ≤150°C, compatible with heat-sensitive substrates such as plastics.
Excellent etching characteristics
High selectivity with photoresist etching, simple graphic process.
Frequently Asked Questions (FAQ)
Q: Why is chromium film widely used as an adhesion layer?
Chromium films exhibit strong chemical bonding and adhesion with diverse substrates including glass, metal, and polymers, making them an ideal choice for transition/adhesion layers in multilayer coatings.
Q: What is the typical hardness value of these chromium coatings?
The hardness of the chromium film can reach between 800 and 1000 HV. This high hardness level provides excellent scratch and wear resistance for the coated components.
Q: How does the film perform under harsh environmental conditions?
Due to its superior corrosion resistance and the natural formation of a dense Cr₂O₃ passivation layer, the film remains highly stable even in humid, salt spray, and acidic environments.
Q: What factors contribute to the high deposition efficiency of the chromium target?
The high sputtering rate and deposition efficiency are achieved through a high density target composition (≥7.2 g/cm³) combined with an extremely low oxygen content (≤500 ppm).
Q: Can chromium films be deposited on temperature-sensitive substrates?
Yes. The process supports low-temperature deposition capacities down to ≤150°C, which is fully compatible with heat-sensitive substrates such as plastics and polymers.
Q: How does target purity affect the overall film quality?
An ultra-high purity level of ≥99.95% significantly reduces particulate defects and contamination during the sputtering process, ensuring a clean, uniform, and dense film formation.